Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...
VELDHOVEN, The Netherlands--(BUSINESS WIRE)--Brion Technologies, a division of ASML, today announced a new product for its popular Tachyon computational lithography platform. Tachyon MB-SRAF ...
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...
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